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Applications

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KEMSTREAM products address every application and process that requires reactive vapor and aerosol. The range of these applications and these processes is very wide. The most common / typical applications are:
  • Deposition of thin film material by CVD (Chemical Vapor Deposition), ALD (Atomic Layer Deposition), MLD (Molecular Layer Deposition), spray CVD and spray pyrolysis processes
  • Surface modification and functionalization
  • Surface cleaning [1,2-dichloroethylene (trans and cis)]
  • Deposition of single layer molecular film by MLD
  • Vapor phase synthesis of nanoobjects such as nanoparticles and nanotubes
  • Impregnation of a porous substrate with a material by CVI (Chemical Vapor Infiltration)
  • Synthesis of thin film organic polymer by iCVD (initiated CVD)
 

Example of processes adressed

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  • CVD processes can be thermal CVD, Metal Organic CVD (MOCVD), Metal Organic Vapor Phase Epitaxy (MOVPE), injection MOCVD, DLI MOCVD, PPCVD (Pulsed-Pressure CVD), Plasma Enhanced CVD (PECVD), Plasma Assisted CVD (PACVD), PPCVD (Plasma-Promoted CVD), Chemical Vapor Infiltration (CVI), Atmospheric Pressure CVD (APCVD), Aerosol Assisted CVD (AACVD), Combustion CVD (CCVD), Chemical Vapor Combustion (CVC), injection CVD, injection MOCVD, Hot-Wire CVD (HWCVD), Catalytic CVD (Cat-CVD), initiated CVD (iCVD), organic catalytic CVD (O-Cat-CVD), Plasma-Assisted HWCVD (PA-HWCVD), Hot-Mesh CVD (HM-CVD), Hot Filament CVD (HFCVD), Ultra Violet assisted CVD (UV-CVD), photo assisted CVD.
  • CVD like processes can be Modified CVD (MCVD), Vapor Axial Deposition (VAD), Flame Hydrolysis Deposition (FHD), Outside Vapor Deposition (OVD), Inside Vapor Phase Oxidation (IVPO), Plasma CVD (PCVD), Surface Plasma CVD (SPCVD), Plasma Impulsed CVD (PICVD). These processes are mainly used for deposition of silica glass (doped and undoped) for applications such as optical fibers and optical waveguides.
  • ALD processes can be Atomic Layer CVD (ALCVD), Atomic Layer Epitaxy (ALE), Plasma Enhanced ALD (PEALD).

Materials

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The materials that can be obtained are very diverse and can be inorganic, organic (polymers)  and hybrid ones, crystallized or amorphous. They have a very wide range of properties such as electrical, optical, chemical, biological and mechanical properties. They can be electrically isolating, conducting or semi-conducting. They can be photovoltaic, ferroelectric, piezoelectric, thermoelectric, superconducting, magnetic or magneto-resistant. They can be transparent or mirror. They can prevent corrosion and fouling. They can be hard or soft materials. They can combine two or more properties. Inorganic materials that can be deposited by CVD and ALD processes are oxides, nitrides, sulphides, selenides, tellurides, metals and metallic alloys.
 

Precursors and chemicals that can be vaporized

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Vapbox DLI vaporizers can vaporize a very wide range of molecular compounds that can be organic or organometallic, liquid (pure or dissolved in an organic solvent) or solid (dissolved in an organic solvent). Upon request, KEMSTREAM can provide a list of chemicals and precursors that Vapbox DLI vaporizers can inject and vaporize with the corresponding materials that can be deposited. For more details, please contact KEMSTREAM at info@kemstream.com
 
  • 18/07/2014 > Kemstream enters into sales collaboration with HORIBA

    Kemstream enters into a sales collaboration agreement with HORIBA

  • 07/04/2016 > Kemstream’s 10 year anniversary

    Kemstream celebrates its 10th year

  • 01/08/2016 > New Facility

    Since July 2016, KEMSTREAM has moved to its new facility in Montpellier.

  • 15/01/2018 > KEMSTREAM at 2018 E-MRS Spring Meeting in Strasbourg

    KEMSTREAM will exhibit at the 2018 E-MRS Spring Meeting, June 19 to 21, in Strasbourg, France

  • 05/02/2018 > KEMSTREAM at ALD 2018 conference

    KEMSTREAM will exhibit at the ALD/ALE 2018, July 29 to August 1 2018 in Incheon, South Korea

  • 07/02/2018 > New Vapbox 300

    KEMSTREAM releases a new version of the Vapbox 300, its best seller DLI vaporizer